PULSED LASER / ELECTRON DEPOSITION SYSTEM

PULSED LASER DEPOSITION SYSTEM
Neocera’s systems are built for materials R&D and offer maximum flexibility. The advantages of Neocera’s systems will be realized when the user is working with a variety of materials under a variety of processing conditions. The large “bandwidth” in both system design (flexibility) and film processing conditions is unique to Neocera. The systems incorporate the following critical components which are required by scientists -beginning a PLD lab for the first time as well as those who want to experiment with advanced PLD technology.
PULSED ELECTRON DEPOSITION SYSTEM
Pulsed Electron Deposition is a process in which a pulsed (100ns) high power electron beam (approximately 1000A, 15keV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The nonequilibrium heating of the target facilitates stochiometric ablation of the target material. Under optimum conditions, the target stoichiometry is thus preserved in the deposited films. All solid state materials-metals, semiconductors and insulators, can be deposited as thin films with PED.